kw.\*:("Dépôt chimique")
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Controllable growth of 1―7 layers of graphene by chemical vapour depositionZHIQIANG TU; ZHUCHEN LIU; RICHARD, Pierre et al.Carbon (New York, NY). 2014, Vol 73, pp 252-258, issn 0008-6223, 7 p.Article
Etude des différentes étapes du procédé de métallisation chimique. Application à un composite fibres de carbone-résine époxyde = Study of the different steps of the process of electroless plating. Application to a carbon fibers-epoxy resin compositeBoisseau, Laurence; Tremillon, Bernard.1991, 132 p.Thesis
Dépôts chimiques à partir d'une phase gazeuse = Chemical vapor depositionAUDISIO, S.Métallurgie. sd, pp 1-12Book Chapter
Systematic control of the electrical conductivity of poly (3,4-ethylenedioxythiophene) via oxidative chemical vapor deposition (oCVD)SUNG GAP IM; OLIVETTI, Elsa A; GLEASON, Karen K et al.Surface & coatings technology. 2007, Vol 201, Num 22-23, pp 9406-9412, issn 0257-8972, 7 p.Conference Paper
Very high epitaxial growth rate of SiC using MTS as chloride-based precursorPEDERSEN, H; LEONE, S; HENRY, A et al.Surface & coatings technology. 2007, Vol 201, Num 22-23, pp 8931-8934, issn 0257-8972, 4 p.Conference Paper
A study of the effect of excessive free carbon on mean whisker diameters grown by chemical vapor depositionLIM, D. C; LEE, Y. J; CHOI, D. J et al.Surface & coatings technology. 2005, Vol 192, Num 2-3, pp 247-251, issn 0257-8972, 5 p.Article
Mechanisms of graphene growth by chemical vapour deposition on transition metalsSEAH, Choon-Ming; CHAI, Siang-Piao; ABDUL RAHMAN MOHAMED et al.Carbon (New York, NY). 2014, Vol 70, pp 1-21, issn 0008-6223, 21 p.Article
Controlling the growth of CVD carbon from methane on transition metal substratesLI, Wei-Na; DING, Yun-Shuang; SUIB, Steven L et al.Surface & coatings technology. 2005, Vol 190, Num 2-3, pp 366-371, issn 0257-8972, 6 p.Article
Diamond science and technology: Diversity and maturitySWAIN, Greg M.The Electrochemical Society interface. 2003, Vol 12, Num 1, issn 1064-8208, 21, 54 [2 p.]Article
Proceedings of the 16th European Conference on Chemical Vapor Deposition (EUROCVD-16), The Hague, The Netherlands, September 16-21, 2007KLEIJN, Chris R.Surface & coatings technology. 2007, Vol 201, Num 22-23, issn 0257-8972, 655 p.Conference Proceedings
Third Asian Conference on Chemical Vapor Deposition (Third Asian-CVD), Taipei, Taiwan, November 12-14, 2004FENG, Zhe Chuan; CHEN, Chia-Fu; KUO, Cheng-Tzu et al.Surface & coatings technology. 2006, Vol 200, Num 10, issn 0257-8972, 290 p.Conference Proceedings
Electroless nickel: Q & A = Dépôt chimique de nickel: questions et réponsesMACKAY, H. A; ZAKI, N; BAUDRAND, D. W et al.Plating and surface finishing. 1986, Vol 73, Num 7, pp 32-37, issn 0360-3164Article
Electroless copper deposition on aluminum-seeded ABS plasticsDAPENG LI; GOODWIN, Kate; YANG, Chen-Lu et al.Journal of materials science. 2008, Vol 43, Num 22, pp 7121-7131, issn 0022-2461, 11 p.Article
High-quality copper deposited from electroless baths = Cuivre de haute qualité déposé à partir de bains chimiquesBLURTON, K. F.Plating and surface finishing. 1986, Vol 73, Num 1, pp 52-55, issn 0360-3164Article
Aligned array FETs as a route towards THz nanotube transistorsZHEN YU; BURKE, Peter J.Proceedings of SPIE, the International Society for Optical Engineering. 2005, pp 246-253, issn 0277-786X, isbn 0-8194-5775-2, 1Vol, 8 p.Conference Paper
Enhancing quality of carbons nanotubes through a real-time controlled CVD process with application to next-generation nanosystemsLAXMINARAYANA, K; JALILI, N.SPIE proceedings series. 2004, pp 135-146, isbn 0-8194-5306-4, 12 p.Conference Paper
Aligned and coiled carbon nanotubes by microwave chemical vapor depositionJINING XIE; VARADAN, Vijay K.SPIE proceedings series. 2004, pp 147-158, isbn 0-8194-5306-4, 12 p.Conference Paper
Au/nc-Si:H core―shell nanostructures prepared by hot wire assisted plasma enhanced chemical vapor deposition techniqueKEE WAH CHAN; BOON TONG GOH; SAADAH ABDUL RAHMAN et al.Surface & coatings technology. 2013, Vol 231, pp 394-398, issn 0257-8972, 5 p.Conference Paper
Effect of AC electric fields on the aerosol assisted chemical vapour deposition growth of titanium dioxide thin filmsROMERO, Luz; BINIONS, Russell.Surface & coatings technology. 2013, Vol 230, pp 196-201, issn 0257-8972, 6 p.Conference Paper
Preparation of carbon nanotubes by pyrolysis of dimethyl sulfideGAOHUI DU; YONGSHENG ZHOU; BINGSHE XU et al.Materials characterization. 2010, Vol 61, Num 4, pp 427-432, issn 1044-5803, 6 p.Article
Polyimide (PI) films by chemical vapor deposition (CVD) : Novel design, experiments and characterizationPUIG-PEY GONZALEZ, Jaime; LAMURE, Alain; SENOCQ, Francois et al.Surface & coatings technology. 2007, Vol 201, Num 22-23, pp 9437-9441, issn 0257-8972, 5 p.Conference Paper
UHV chemical vapour deposition of silicon nanowiresSCHMIDT, Volker; SENZ, Stephan; GÖSELE, Ulrich et al.Zeitschrift für Metallkunde. 2005, Vol 96, Num 5, pp 427-428, issn 0044-3093, 2 p.Conference Paper
Carbon nanoflake growth from carbon nanotubes by hot filament chemical vapor depositionSAHOO, Subasa C; MOHAPATRA, Dipti R; LEE, Hak-Joo et al.Carbon (New York, NY). 2014, Vol 67, pp 704-711, issn 0008-6223, 8 p.Article
Experimental and computational investigation of chemical vapor deposition of Cu from Cu amidinateAVIZIOTIS, Ioannis G; CHEIMARIOS, Nikolaos; VAHLAS, Constantin et al.Surface & coatings technology. 2013, Vol 230, pp 273-278, issn 0257-8972, 6 p.Conference Paper
TiOxNy coatings grown by atmospheric pressure metal organic chemical vapor depositionMAURY, F; DUMINICA, F.-D.Surface & coatings technology. 2010, Vol 205, Num 5, pp 1287-1293, issn 0257-8972, 7 p.Conference Paper